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E01400 - SEMI E14 - Measurement of Particle Contamination Contributed to the Product from the Process or Support Tool StdPbc-1017 and wafer size transition

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Description

and wafer size transition

SEMI E49-0702 (technical revision)

and the lifetime measurement is in many cases done without any surface passivation or without confirming that the surface passivation is perfect

A purchase specification may include requirements for additional physical properties as listed in this Specification

E01400 - SEMI E14 - Measurement of Particle Contamination Contributed to the Product from the Process or Support Tool StdPbc-1017 and wafer size transitionNOTICE: This document was withdrawn in accordance with the Regulations Governing SEMI Standards in 2003. The purpose of this document is to provide a standardized methodology and detailed procedure for measuring the contamination performance of a particular process or tool in terms of the number and size distribution of particles added to a silicon wafer as a result of having been passed through that process tool. Referenced SEMI Standards SEMI M10

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